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NanoCalc Series

/ Spectrometer systems

The spectroscopic reflectometry systems

The NanoCalc Series are part of the mikropack product line of thin film metrology systems. The NanoCalc systems are versatile and configurable thin film measurement systems utilising spectroscopic reflectometry to accurately determine optical and non-optical thin film thicknesses for consumer, semiconductor, medical and industrial applications in a wide range of fields.

  • resolution to 0.1 nm
  • can measure up to 10 layer stacks
  • refractive index
  • sophisticated algorithms enable defect and roughness tolerant measurements
  • large database to ensure accuracy over a broad range of materials
  • adaptors for complex geometries and accessories for thickness mapping
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NanoCalc-VIS
Wavelenght range 400-850 nm
Thickness range 50 nm – 20 μm
Optical resolution 0.1 nm
Repeatability 0.3 nm

 

NanoCalc-XR
Wavelenght range 250-1050 nm
Thickness range 10 nm – 100 μm
Optical resolution 0.1 nm
Repeatability 0.3 nm

 

NanoCalc-DUV
Wavelenght range 190-1100 nm
Thickness range 1 nm – 100 μm
Optical resolution 0.1 nm
Repeatability 0.3 nm

 

NanoCalc-NIR
Wavelenght range 900-1700 nm
Thickness range 100 nm – 250 μm
Optical resolution 0.1 nm
Repeatability 1 nm

 

Spectroscopic
Angle of incidence  90° or 70°
Number of layers Up to 10
Refractive Index Yes
Test materials Transparent or semitransparent thin film materials
Reference needed Yes, bare substrate
Measurement Modes Reflection and transmission
Rough materials Yes
Measurement speed 100 ms to 1s
On-line possibilities Yes
Mechanical tolerance (height) With collimation (COL-UV-6.35)
Spot size Standard: 200 μm or 400 μm; optional 100μm on request
Microspot Yes, in combination with microscope
CCD colour Yes, in combination with microscope
 Mapping option 6″ or 12″ xy-scanning stage
Vacuum possibilities Yes
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  • transmission and reflection measurements of anti-reflective & hardness coatings
  • analysing medical coatings and catheter balloon foils
  • testing hardness and wear coatings
  • measuring thickness of thinned silicon wafers
  • determining photo resists for masks
  • analysing coatings applied for weather or dirt resistance (lotus effect)
  • measuring coatings inside drinks containers
  • air gap measurements
  • optical disk coating analysis (CD, DVD, … )
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