The spectroscopic reflectometry systems
The NanoCalc Series are part of the mikropack product line of thin film metrology systems. The NanoCalc systems are versatile and configurable thin film measurement systems utilising spectroscopic reflectometry to accurately determine optical and non-optical thin film thicknesses for consumer, semiconductor, medical and industrial applications in a wide range of fields. NanoCalc system measures anti-reflective coatings, anti-scratch coatings and rough layers on substrates such as steel, aluminum, brass, copper, ceramics and plastics.
The NanoCalc Thin Film Reflectometry System allows you to analyze the thickness of optical layers from 1 nm to 250 µm. You can observe a single thickness with a resolution of 0.1 nm and analyze single-layer or multilayer films in less than one second
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- Resolution to 0.1 nm
- Can measure up to 10 layer stacks
- Angle of incidence: 90°
- In-situ & on-line thickness measurements
- Refractive index measurement
- sophisticated algorithms for defect and roughness measurements
- large database to ensure accuracy over a broad range of materials
- adaptors for complex geometries and accessories for thickness mapping
- Transmission and reflection measurements of anti-reflective & hardness coatings
- Analysing medical coatings and catheter balloon foils
- Testing hardness and wear coatings
- Measuring thickness of thinned silicon wafers
- Determining photo resists for masks
- Analysing coatings applied for weather or dirt resistance (lotus effect)
- Measuring coatings inside drinks containers
- Air gap measurements
- Optical disk coating analysis (CD, DVD, … )
| NanoCalc-VIS | |
|---|---|
| Wavelenght range | 400-850 nm |
| Thickness range | 50 nm - 20 μm |
| Optical resolution | 0.1 nm |
| Repeatability | 0.3 nm |
| NanoCalc-XR | |
| Wavelenght range | 250-1050 nm |
| Thickness range | 10 nm - 100 μm |
| Optical resolution | 0.1 nm |
| Repeatability | 0.3 nm |
| NanoCalc-DUV | |
| Wavelenght range | 190-1100 nm |
| Thickness range | 1 nm - 100 μm |
| Optical resolution | 0.1 nm |
| Repeatability | 0.3 nm |
| NanoCalc-NIR | |
| Wavelenght range | 900-1700 nm |
| Thickness range | 100 nm - 250 μm |
| Optical resolution | 0.1 nm |
| Repeatability | 1 nm |
| Spectroscopic | |
| Angle of incidence | 90° or 70° |
| Number of layers | Up to 10 |
| Refractive Index | Yes |
| Test materials | Transparent or semitransparent thin film materials |
| Reference needed | Yes, bare substrate |
| Measurement Modes | Reflection and transmission |
| Rough materials | Yes |
| Measurement speed | 100 ms to 1s |
| On-line possibilities | Yes |
| Mechanical tolerance (height) | With collimation (COL-UV-6.35) |
| Spot size | Standard: 200 μm or 400 μm; optional 100μm on request |
| Microspot & CCD colour | Yes, in combination with microscope |
| Mapping option | 6" or 12" xy-scanning stage |
| Vacuum possibilities | Yes |
