The PlasCalc Plasma monitoring system measures plasma emission from 200-1100 nm in only 3 milliseconds. The PlasCalc benefits from advanced process control systems and sophisticated algorithms for data acquisition.
The recipe Editor tool allows you to easily and rapidly configure, build and save experiment methods. it is easy to build robust recipes for the most difficult plasma processes such as mea- suring film deposition, monitoring plasma etching, examining surface cleaning, analyzing plasma chamber health control and monitoring abnormal pollution or discharge phenomena.
|spectral range||200-1100 nm|
|optical resolution||1.0 nm (FWHm)|
|D/A converter||14 bit|
|digital input/output||8 x ttl|
|analog output||4 x [0-10V]|
|power consumption||12 VDC @ 1.25 a|
|power requirements||90-240 VaC 50/60 Hz|
|dimensions||257 mm x 152 mm x 263 mm|
PlasCalc comes with an operating software.