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Plasma monitoring system (PlasCalc)

/ Spectrometer systems

Plasma monitoring & control

The PlasCalc Plasma monitoring system measures plasma emission from 200-1100 nm in only 3 milliseconds. The PlasCalc benefits from advanced process control systems and sophisticated algorithms for data acquisition.

The recipe Editor tool allows you to easily and rapidly configure, build and save experiment methods. it is easy to build robust recipes for the most difficult plasma processes such as mea- suring film deposition, monitoring plasma etching, examining surface cleaning, analyzing plasma chamber health control and monitoring abnormal pollution or discharge phenomena.

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  • 1.0 nm (FWHm) optical resolution
  • 200-1100 nm range
  • Rapidly build and save experiment methods
  • Film deposition measuring
  • Plasma etching monitoring
  • Surface cleaning examination
  • Analyzing plasma chamber health control
  • Monitoring abnormal pollution
  • Monitoring discharge phenomena
spectral range200-1100 nm
optical resolution1.0 nm (FWHm)
D/A converter14 bit
digital input/output8 x ttl
analog output4 x [0-10V]
interfaceUsB 1.1
power consumption12 VDC @ 1.25 a
power requirements90-240 VaC 50/60 Hz
dimensions257 mm x 152 mm x 263 mm
weight5 kg

PlasCalc comes with an operating software.

The Integrated Formula Editor provides easy access to a full range of mathematical and algorithmic functions. An optional Emission Wavelength Library, available for a separate price, provides species identification, while the Wavelength Editor allows you to optimize signal-to-noise. A dual-window interface shows the actual spectrum and all process control information.
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